Invention Grant
US08411252B2 Lithographic apparatus and device manufacturing method utilizing a substrate handler
有权
利用基板处理器的平版印刷设备和器件制造方法
- Patent Title: Lithographic apparatus and device manufacturing method utilizing a substrate handler
- Patent Title (中): 利用基板处理器的平版印刷设备和器件制造方法
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Application No.: US12639457Application Date: 2009-12-16
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Publication No.: US08411252B2Publication Date: 2013-04-02
- Inventor: Hernes Jacobs , Bernardus Antonius Johannes Luttikhuis , Harmen Klaas Van Der Schoot , Petrus Matthijs Henricus Vosters
- Applicant: Hernes Jacobs , Bernardus Antonius Johannes Luttikhuis , Harmen Klaas Van Der Schoot , Petrus Matthijs Henricus Vosters
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03B27/52
Abstract:
A substrate handler is provided. The substrate handler includes a support surface configured to carry a substrate and a pre-conditioning unit configured to pre-condition the substrate. The substrate handler is configured to move the substrate relative to a substrate table.
Public/Granted literature
- US20100085553A1 Lithographic Apparatus and Device Manufacturing Method Utilizing a Substrate Handler Public/Granted day:2010-04-08
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