Invention Grant
US08411270B2 Monitoring stage alignment and related stage and calibration target
失效
监测阶段对准及相关阶段和校准目标
- Patent Title: Monitoring stage alignment and related stage and calibration target
- Patent Title (中): 监测阶段对准及相关阶段和校准目标
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Application No.: US12015789Application Date: 2008-01-17
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Publication No.: US08411270B2Publication Date: 2013-04-02
- Inventor: Shahin Zangooie , Lin Zhou , Roger M. Young , Clemente Bottini , Ronald D. Fiege
- Applicant: Shahin Zangooie , Lin Zhou , Roger M. Young , Clemente Bottini , Ronald D. Fiege
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Hoffman Warnick LLC
- Agent Ian D. MacKinnon
- Main IPC: G01B11/00
- IPC: G01B11/00
Abstract:
Methods, apparatuses and systems for monitoring a stage alignment in a processing system are disclosed. A method for monitoring a stage alignment in a processing system may include providing a calibration target on a surface of the stage; measuring an angle of incident of a light beam to the calibration target; and monitoring the stage alignment based on the determined angle of incidence.
Public/Granted literature
- US20090185183A1 MONITORING STAGE ALIGNMENT AND RELATED STAGE AND CALIBRATION TARGET Public/Granted day:2009-07-23
Information query
