Invention Grant
- Patent Title: Scatterometry method and device for inspecting patterned medium
- Patent Title (中): 用于检查图案化介质的散射法和装置
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Application No.: US12482126Application Date: 2009-06-10
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Publication No.: US08411928B2Publication Date: 2013-04-02
- Inventor: Hideaki Sasazawa , Takenori Hirose , Minoru Yoshida , Keiya Saito , Shigeru Serikawa
- Applicant: Hideaki Sasazawa , Takenori Hirose , Minoru Yoshida , Keiya Saito , Shigeru Serikawa
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Foley & Lardner LLP
- Priority: JP2008-269633 20081020
- Main IPC: G06K9/00
- IPC: G06K9/00

Abstract:
An inspection region is specified using the design information to perform region division for measurement through a scatterometry method. The obtained detection data is classified by pattern into a periodic region and a non-periodic region. A spectroscopic characteristic is detected by an optical sensor to extract features. The extracted features are compared with features stored in a feature map database for each region to evaluate a state of a patterned medium.
Public/Granted literature
- US20100098320A1 METHOD AND DEVICE FOR INSPECTING PATTERNED MEDIUM Public/Granted day:2010-04-22
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