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US08413083B2 Mask system employing substantially circular optical proximity correction target and method of manufacture thereof 有权
采用基本圆形光学邻近校正目标的掩模系统及其制造方法

Mask system employing substantially circular optical proximity correction target and method of manufacture thereof
Abstract:
A method of manufacture of a mask system includes: providing design data; generating a substantially circular optical proximity correction target from the design data; biasing a segment of the substantially circular optical proximity correction target; and generating mask data based on the shape produced by biasing the segment of the substantially circular optical proximity correction target.
Abstract(Chinese):

掩模系统的制造方法包括：提供设计数据; 从设计数据生成基本圆形的光学邻近校正目标; 偏置基本圆形的光学邻近校正目标的一段; 以及基于通过偏置基本圆形的光学邻近校正目标的段而产生的形状来产生掩模数据。

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