Invention Grant
- Patent Title: Semiconductor dynamic quantity sensor and method of manufacturing the same
- Patent Title (中): 半导体动态量传感器及其制造方法
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Application No.: US12801405Application Date: 2010-06-08
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Publication No.: US08413507B2Publication Date: 2013-04-09
- Inventor: Tetsuo Fujii , Hisanori Yokura , Hirofumi Higuchi
- Applicant: Tetsuo Fujii , Hisanori Yokura , Hirofumi Higuchi
- Applicant Address: JP Kariya
- Assignee: DENSO CORPORATION
- Current Assignee: DENSO CORPORATION
- Current Assignee Address: JP Kariya
- Agency: Posz Law Group, PLC
- Priority: JP2009-138494 20090609
- Main IPC: G01C19/56
- IPC: G01C19/56 ; G01P15/125

Abstract:
A semiconductor dynamic quantity sensor has a substrate including a semiconductor substrate, an insulation layer on a main surface of the semiconductor substrate, and a semiconductor layer on the insulation layer. The main surface has a projection that is trapezoidal or triangular in cross section. The semiconductor layer is divided by a through hole into a movable portion. A tip of the projection is located directly below the movable portion and spaced from the movable portion by a predetermined distance in a thickness direction of the substrate. A width of the tip of the projection is less than a width of the movable portion in a planar direction of the substrate. The distance between the tip of the projection and the movable portion is equal to a thickness of the insulation layer.
Public/Granted literature
- US20100307246A1 Semiconductor dynamic quantity sensor and method of manufacturing the same Public/Granted day:2010-12-09
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