Invention Grant
- Patent Title: Linear escapements, methods for making, and use
- Patent Title (中): 线性擒纵机构,制造和使用方法
-
Application No.: US12731098Application Date: 2010-03-24
-
Publication No.: US08413582B1Publication Date: 2013-04-09
- Inventor: Richard T. Chen
- Applicant: Richard T. Chen
- Applicant Address: US CA Van Nuys
- Assignee: Microfabrica Inc.
- Current Assignee: Microfabrica Inc.
- Current Assignee Address: US CA Van Nuys
- Agent Dennis R. Smalley
- Main IPC: F42C15/20
- IPC: F42C15/20 ; F42C15/184

Abstract:
The present invention relates generally to the field of escapement mechanisms for providing mechanical control of motion based on desired timing criteria and more particularly to micro-scale and millimeter scale escapement mechanisms, and even more particularly to such mechanisms produced in whole or in part using multi-layer, multi-material electrochemical fabrication methods. In some embodiments, such escapement mechanisms are used in safing and arming applications for munitions or other explosive devices where two or more accelerations are present at appropriate times where after an arming delay occurs.
Information query