Invention Grant
US08414733B2 Photosensitive resin composition for optical waveguide formation, optical waveguide and method for producing optical waveguide 失效
用于光波导形成的光敏树脂组合物,光波导和用于制造光波导的方法

  • Patent Title: Photosensitive resin composition for optical waveguide formation, optical waveguide and method for producing optical waveguide
  • Patent Title (中): 用于光波导形成的光敏树脂组合物,光波导和用于制造光波导的方法
  • Application No.: US12915244
    Application Date: 2010-10-29
  • Publication No.: US08414733B2
    Publication Date: 2013-04-09
  • Inventor: Katsumi MaedaKaichiro Nakano
  • Applicant: Katsumi MaedaKaichiro Nakano
  • Applicant Address: JP Tokyo
  • Assignee: NEC Corporation
  • Current Assignee: NEC Corporation
  • Current Assignee Address: JP Tokyo
  • Agency: Sughrue Mion, PLLC
  • Priority: JP2005-326225 20051110
  • Main IPC: G02B6/02
  • IPC: G02B6/02 G03F7/20
Photosensitive resin composition for optical waveguide formation, optical waveguide and method for producing optical waveguide
Abstract:
The present invention has an object to provide a photosensitive resin composition for optical waveguide formation, which has low transmission loss and can form a waveguide pattern with high shape accuracy at low cost; an optical waveguide; and a method for producing an optical waveguide. The present invention provides a photosensitive resin composition for optical waveguide formation comprising at least: a polymer containing at least a (meth)acrylate structure unit having an epoxy structure, and a (meth)acrylate structure unit having a lactone structure and/or a vinyl monomer structure unit having an aromatic structure; and a photoacid generator, of which one or both of a core layer and a cladding layer are formed of a cured product.
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