Invention Grant
- Patent Title: Process for producing fluorocarbon microstructure, fluorocarbon microstructure, and microsystem
- Patent Title (中): 生产氟碳微结构,碳氟微结构和微系统的工艺
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Application No.: US12522871Application Date: 2008-01-21
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Publication No.: US08414782B2Publication Date: 2013-04-09
- Inventor: Takahiro Arakawa , Hiroyuki Kusakawa , Shuichi Shoji
- Applicant: Takahiro Arakawa , Hiroyuki Kusakawa , Shuichi Shoji
- Applicant Address: JP Tokyo
- Assignee: Waseda University
- Current Assignee: Waseda University
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2007-010065 20070119
- International Application: PCT/JP2008/050724 WO 20080121
- International Announcement: WO2008/088067 WO 20080724
- Main IPC: C23F3/00
- IPC: C23F3/00 ; B44C1/22

Abstract:
A process for producing a fluorocarbon microstructure capable of easily fabricating a three-dimensional fluorocarbon microstructure. The process for producing a fluorocarbon microstructure comprises a first processing step for forming, on a substrate (2), a film deposition portion with a given pattern made up of a through-hole figure by etching the substrate (2), a fabricating step for forming a fluorocarbon film (6) on an inner circumferential surface of a film deposition portion (9) to fabricate a fluorocarbon region surrounded by the fluorocarbon film (6), and a second processing step for fabricating the fluorocarbon microstructure protruding from a processing surface of the substrate (2) by etching a given region other than a fluorocarbon region on the substrate (2). Hence, the three-dimensional fluorocarbon microstructure can be fabricated which comprises a complicated structure that has conventionally been hard to fabricate. Thus, a microchannel (1) equipped with the three-dimensional fluorocarbon microstructure can be easily fabricated.
Public/Granted literature
- US20100167014A1 PROCESS FOR PRODUCING FLUOROCARBON MICROSTRUCTURE, FLUOROCARBON MICROSTRUCTURE, AND MICROSYSTEM Public/Granted day:2010-07-01
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