Invention Grant
- Patent Title: Method and apparatus for continuous coating
- Patent Title (中): 连续涂层的方法和装置
-
Application No.: US12637415Application Date: 2009-12-14
-
Publication No.: US08414975B2Publication Date: 2013-04-09
- Inventor: Hwei-Lang Chang , Zone-Sure Chang
- Applicant: Hwei-Lang Chang , Zone-Sure Chang
- Applicant Address: TW Lungtan, Taoyuan
- Assignee: Atomic Energy Council—Institute of Nuclear Energy Research
- Current Assignee: Atomic Energy Council—Institute of Nuclear Energy Research
- Current Assignee Address: TW Lungtan, Taoyuan
- Agency: Jackson IPG PLLC
- Priority: TW98115082A 20090507
- Main IPC: B05D5/00
- IPC: B05D5/00 ; B05D5/06

Abstract:
Disclosed is a method and apparatus for continuous coating with a rotational die in which coating materials flow in a radial direction. The linear speed of a substrate in need of coating is identical to the tangential speed of the surface of the rotational die so that the coating material, which flows in a radial direction of the rotational die, flows onto the substrate perpendicularly. Therefore, the ingredients of coating materials overlap one another (or stand vertically as a layer), and the vertical sequence of the coating material is ensured. This method and apparatus can be used to make organic electronic devices, organic light-emitting diodes and organic photovoltaic devices. Particularly, this method and apparatus can be used in bulk-hetero-junction of mixed coating of P-type and N-type semiconductors.
Public/Granted literature
- US20100285220A1 Method and Apparatus for Continuous Coating Public/Granted day:2010-11-11
Information query