Invention Grant
US08415010B2 Nano-imprint lithography stack with enhanced adhesion between silicon-containing and non-silicon containing layers
有权
具有增强的含硅层和非含硅层之间的粘附性的纳米压印光刻堆叠
- Patent Title: Nano-imprint lithography stack with enhanced adhesion between silicon-containing and non-silicon containing layers
- Patent Title (中): 具有增强的含硅层和非含硅层之间的粘附性的纳米压印光刻堆叠
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Application No.: US12581634Application Date: 2009-10-19
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Publication No.: US08415010B2Publication Date: 2013-04-09
- Inventor: Weijun Liu , Frank Y. Xu
- Applicant: Weijun Liu , Frank Y. Xu
- Applicant Address: US TX Austin
- Assignee: Molecular Imprints, Inc.
- Current Assignee: Molecular Imprints, Inc.
- Current Assignee Address: US TX Austin
- Agency: Fish & Richardson P.C.
- Agent Heather L. Flanagan
- Main IPC: B32B27/08
- IPC: B32B27/08
Abstract:
A nano-imprint lithography stack includes a nano-imprint lithography substrate, a non-silicon-containing layer solidified from a first polymerizable, non-silicon-containing composition, and a silicon-containing layer solidified from a polymerizable silicon-containing composition adhered to a surface of the non-silicon-containing layer. The non-silicon-containing layer is adhered directly or through one or more intervening layers to the nano-imprint lithography substrate. The silicon-containing layer includes a silsesquioxane with a general formula (R′(4-2z)SiOz)x(HOSiO1.5)y, wherein R′ is a hydrocarbon group or two or more different hydrocarbon groups other than methyl, 1
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