Invention Grant
US08415080B2 Method for applying a resist layer, uses of adhesive materials, and adhesive materials and resist layer
有权
涂布抗蚀剂层的方法，粘合剂材料的用途以及粘合剂材料和抗蚀剂层
- Patent Title: Method for applying a resist layer, uses of adhesive materials, and adhesive materials and resist layer
- Patent Title (中): 涂布抗蚀剂层的方法，粘合剂材料的用途以及粘合剂材料和抗蚀剂层
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Application No.: US13178710Application Date: 2011-07-08
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Publication No.: US08415080B2Publication Date: 2013-04-09
- Inventor: Werner Kroeninger , Manfred Schneegans
- Applicant: Werner Kroeninger , Manfred Schneegans
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/34 ; G03F7/42 ; G03F7/16 ; G03C11/12
Abstract:
A method in which a resist layer is applied to a base layer is disclosed. The resist layer includes an adhesive material, and the adhesive force of the adhesive material decreases or increases during an irradiation process. Residues of the resist layer may be stripped using the disclosed method.
Public/Granted literature
- US20110269073A1 METHOD FOR APPLYING A RESIST LAYER, USES OF ADHESIVE MATERIALS, AND ADHESIVE MATERIALS AND RESIST LAYER Public/Granted day:2011-11-03
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