Invention Grant
- Patent Title: Photosensitive resin composition having a high refractive index
- Patent Title (中): 具有高折射率的光敏树脂组合物
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Application No.: US11570733Application Date: 2004-06-17
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Publication No.: US08415081B2Publication Date: 2013-04-09
- Inventor: Christopher K. Ober , Yasuharu Murakami
- Applicant: Christopher K. Ober , Yasuharu Murakami
- Applicant Address: US NY Ithaca JP Tokyo
- Assignee: Cornell Research Foundation, Inc.,Hitachi Chemical Co., Ltd.
- Current Assignee: Cornell Research Foundation, Inc.,Hitachi Chemical Co., Ltd.
- Current Assignee Address: US NY Ithaca JP Tokyo
- Agent William A Blake
- International Application: PCT/US2004/016620 WO 20040617
- International Announcement: WO2006/009526 WO 20060126
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/038 ; B29C35/08
Abstract:
The present invention discloses a photosensitive resin composition which comprises (A) a compound having a molecule with at least one thiirane ring and a total number of a thiirane ring and/or an epoxy ring of at least 2 in the molecule, and (B) a photo acid generator, said composition having a refractive index of at least 1.6, and a method of obtaining a high refractive index periodical structure which comprises subjecting the photosensitive resin composition to photolithography.
Public/Granted literature
- US20080038665A1 Photosensitive Resin Composition Having a High Refractive Index Public/Granted day:2008-02-14
Information query
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