Invention Grant
- Patent Title: Wafer level conformal coating for LED devices
- Patent Title (中): LED器件的晶圆级保形涂层
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Application No.: US12951662Application Date: 2010-11-22
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Publication No.: US08415183B2Publication Date: 2013-04-09
- Inventor: Hsing-Kuo Hsia , Chih-Kuang Yu , Hung-Yi Kuo , Hung-Wen Huang
- Applicant: Hsing-Kuo Hsia , Chih-Kuang Yu , Hung-Yi Kuo , Hung-Wen Huang
- Applicant Address: TW Hsinchu
- Assignee: TSMC Solid State Lighting Ltd.
- Current Assignee: TSMC Solid State Lighting Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Haynes and Boone, LLP
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
Provided is a method of fabricating a light-emitting diode (LED) device. The method includes providing a wafer. The wafer has light-emitting diode (LED) devices formed thereon. The method includes immersing the wafer into a polymer solution that has a surface tension lower than that of acetic acid. The polymer solution contains a liquid polymer and phosphor particles. The method includes lifting the wafer out of the polymer solution at a substantially constant speed. The method includes drying the wafer. The above processes form a conformal coating layer at least partially around the LED devices. The coating layer includes the phosphor particles. The coating layer also has a substantially uniform thickness.
Public/Granted literature
- US20120129282A1 WAFER LEVEL CONFORMAL COATING FOR LED DEVICES Public/Granted day:2012-05-24
Information query
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