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US08415187B2 Large-grain crystalline thin-film structures and devices and methods for forming the same 有权
大晶粒结晶薄膜结构及其形成装置及方法

Large-grain crystalline thin-film structures and devices and methods for forming the same
Abstract:
Methods for forming semiconductor devices include providing a crystalline template having an initial grain size, annealing the crystalline template, the annealed template having a final grain size larger than the initial grain size, forming a buffer layer over the annealed template, and forming a semiconductor layer over the buffer layer.
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