Invention Grant
- Patent Title: Nonvolatile semiconductor memory device and method of manufacturing the same
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Application No.: US12886135Application Date: 2010-09-20
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Publication No.: US08415242B2Publication Date: 2013-04-09
- Inventor: Ichiro Mizushima , Shinji Mori , Yoshiaki Fukuzumi , Fumiki Aiso
- Applicant: Ichiro Mizushima , Shinji Mori , Yoshiaki Fukuzumi , Fumiki Aiso
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2010-066706 20100323
- Main IPC: H01L21/3205
- IPC: H01L21/3205

Abstract:
According to one embodiment, a nonvolatile semiconductor memory device is provided in which memory strings, which are formed by providing a plurality of transistors having gate electrode films on sides of columnar semiconductor films in a height direction of the columnar semiconductor films via charge storage layers, are substantially perpendicularly arranged in a matrix shape on a substrate. A coupling section made of a semiconductor material that connects lower portions of the columnar semiconductor films forming a pair of the memory strings adjacent to each other in a predetermined direction is provided. Each of the columnar semiconductor films is formed of a generally single-crystal-like germanium film or silicon germanium film.
Public/Granted literature
- US20110233646A1 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2011-09-29
Information query
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