Invention Grant
- Patent Title: Method of forming a high density structure
- Patent Title (中): 形成高密度结构的方法
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Application No.: US13054277Application Date: 2009-07-14
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Publication No.: US08415246B2Publication Date: 2013-04-09
- Inventor: Jeroen van den Brand , Andreas Heinrich Dietzel
- Applicant: Jeroen van den Brand , Andreas Heinrich Dietzel
- Applicant Address: NL Delft
- Assignee: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
- Current Assignee: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
- Current Assignee Address: NL Delft
- Agency: Novak Druce Connolly Bove + Quigg LLP
- Priority: EP08160452 20080715
- International Application: PCT/NL2009/050430 WO 20090714
- International Announcement: WO2010/008281 WO 20100121
- Main IPC: H01L21/768
- IPC: H01L21/768
Abstract:
A method of forming a high density structure may include the steps of providing a substrate wherein the high density structure is to be formed with a release liner, the release liner being self-removable; forming at least one cavity in the substrate through the release liner, the at least one cavity forming at least a part of the high density structure; at least partially filling the at least one cavity with a filler material; sintering the thus formed structure; and removing the release liner from the substrate.
Public/Granted literature
- US20110159683A1 METHOD OF FORMING A HIGH DENSITY STRUCTURE Public/Granted day:2011-06-30
Information query
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