Invention Grant
US08415424B2 Aromatic ring-containing polymer for underlayer of resist and resist underlayer composition including the same
有权
含有芳族环的抗蚀剂底层聚合物和含有它的抗蚀剂下层组合物
- Patent Title: Aromatic ring-containing polymer for underlayer of resist and resist underlayer composition including the same
- Patent Title (中): 含有芳族环的抗蚀剂底层聚合物和含有它的抗蚀剂下层组合物
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Application No.: US13540202Application Date: 2012-07-02
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Publication No.: US08415424B2Publication Date: 2013-04-09
- Inventor: Min-Soo Kim , Hwan-Sung Cheon , Sung-Wook Cho , Seung-Bae Oh , Jee-Yun Song
- Applicant: Min-Soo Kim , Hwan-Sung Cheon , Sung-Wook Cho , Seung-Bae Oh , Jee-Yun Song
- Applicant Address: KR Gumi-si, Kyeongsangbuk-do
- Assignee: Cheil Industries, Inc.
- Current Assignee: Cheil Industries, Inc.
- Current Assignee Address: KR Gumi-si, Kyeongsangbuk-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2009-0136186 20091231
- Main IPC: C08L29/14
- IPC: C08L29/14 ; C08F216/34 ; G03C1/00 ; C08F8/00
Abstract:
An aromatic ring-containing polymer for an underlayer of a resist, including a unit structure represented by Chemical Formula 1:
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