Invention Grant
US08415599B2 Device for measuring the defects of an imaging instrument with two opto-electronic sensors
有权
用于测量具有两个光电传感器的成像仪器的缺陷的装置
- Patent Title: Device for measuring the defects of an imaging instrument with two opto-electronic sensors
- Patent Title (中): 用于测量具有两个光电传感器的成像仪器的缺陷的装置
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Application No.: US12742614Application Date: 2008-11-07
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Publication No.: US08415599B2Publication Date: 2013-04-09
- Inventor: Olivier Pigouche , Didier Dantes
- Applicant: Olivier Pigouche , Didier Dantes
- Applicant Address: FR Neuilly-sur-Seine
- Assignee: Thales
- Current Assignee: Thales
- Current Assignee Address: FR Neuilly-sur-Seine
- Agency: Baker Hostetler LLP
- Priority: FR0707967 20071113
- International Application: PCT/EP2008/065133 WO 20081107
- International Announcement: WO2009/062890 WO 20090522
- Main IPC: G06K9/00
- IPC: G06K9/00 ; G02B27/64
Abstract:
The present invention relates to a device for measuring defects of an imaging instrument with a sensor that is accurate, simple to produce and implement and inexpensive. According to the invention, this device comprising at least one second sensor, similar to the first, inclined relative thereto and imaging the same region as the first sensor, and a device for calculating the defocusing of each element of this other sensor.
Public/Granted literature
- US20100278378A1 Device for Measuring the Defects of an Imaging Instrument with Two Opto-Electronic Sensors Public/Granted day:2010-11-04
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