Invention Grant
- Patent Title: Method and device for monitoring the intensity of an electron beam
- Patent Title (中): 用于监测电子束强度的方法和装置
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Application No.: US13133749Application Date: 2010-04-20
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Publication No.: US08415633B2Publication Date: 2013-04-09
- Inventor: Gernot Keil , Alois Monzel
- Applicant: Gernot Keil , Alois Monzel
- Applicant Address: DE Dortmund
- Assignee: KHS GmbH
- Current Assignee: KHS GmbH
- Current Assignee Address: DE Dortmund
- Agency: Occhiuti Rohlicek & Tsao LLP
- Priority: DE102009018210 20090421
- International Application: PCT/EP2010/002396 WO 20100420
- International Announcement: WO2010/121775 WO 20101028
- Main IPC: G01T1/24
- IPC: G01T1/24
Abstract:
The method and the device are used to monitor the intensity of an electron beam. In order to detect changes in intensity of the electron beam, electromagnetic radiation directly or indirectly emitted by the electron beam is detected and evaluated. This particularly refers to the evaluation of ultraviolet radiation and/or radiation in the range of visible light.
Public/Granted literature
- US20110233414A1 METHOD AND DEVICE FOR MONITORING THE INTENSITY OF AN ELECTRON BEAM Public/Granted day:2011-09-29
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