Invention Grant
US08415636B2 Method for inspecting two-dimensional array X-ray detector 失效
二维阵列X射线探测器检测方法

  • Patent Title: Method for inspecting two-dimensional array X-ray detector
  • Patent Title (中): 二维阵列X射线探测器检测方法
  • Application No.: US13580318
    Application Date: 2011-03-03
  • Publication No.: US08415636B2
    Publication Date: 2013-04-09
  • Inventor: Kenji Sato
  • Applicant: Kenji Sato
  • Applicant Address: JP Kyoto
  • Assignee: Shimadzu Corporation
  • Current Assignee: Shimadzu Corporation
  • Current Assignee Address: JP Kyoto
  • Agency: McDermott Will & Emery LLP
  • Priority: JP2010-051521 20100309
  • International Application: PCT/JP2011/054848 WO 20110303
  • International Announcement: WO2011/111590 WO 20110915
  • Main IPC: G01T1/20
  • IPC: G01T1/20
Method for inspecting two-dimensional array X-ray detector
Abstract:
Disclosed is a two-dimensional X-ray detector array inspection method capable of recognizing two-dimensional X-ray detector arrays unsuitable for X-ray imaging by means of identifying quickly growing defective pixels. The two-dimensional X-ray detector array inspection method involves a bias voltage step for repeated supply and stopping of a bias voltage from a common electrode; a dark current value measurement step for measuring the pixel values of pixels in a non-X-ray-irradiating state; a defective pixel identification step for identifying defective pixels on the basis of the pixel values of the pixels measured in the dark current value measurement step; and a determination step for determining whether or not the two-dimensional X-ray array detector is suitable on the basis of the size of the missing pixel chunks or the total number of defective pixels identified in defective pixel identification step.
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