Invention Grant
- Patent Title: Low resistance ultraviolet light emitting device and method of fabricating the same
- Patent Title (中): 低电阻紫外光发射装置及其制造方法
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Application No.: US12934650Application Date: 2009-03-27
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Publication No.: US08415654B2Publication Date: 2013-04-09
- Inventor: Asif Khan , Qhalid Fareed , Vinod Adivarahan
- Applicant: Asif Khan , Qhalid Fareed , Vinod Adivarahan
- Applicant Address: US SC Irmo
- Assignee: Nitek, Inc.
- Current Assignee: Nitek, Inc.
- Current Assignee Address: US SC Irmo
- Agency: Nexsen Pruet, LLC
- Agent Michael A. Mann
- International Application: PCT/US2009/038628 WO 20090327
- International Announcement: WO2009/120998 WO 20091001
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L31/00

Abstract:
A low resistance light emitting device with an ultraviolet light-emitting structure having a first layer with a first conductivity, a second layer with a second conductivity; and a light emitting quantum well region between the first layer and second layer. A first electrical contact is in electrical connection with the first layer and a second electrical contact is in electrical connection with the second layer. A template serves as a platform for the light-emitting structure. The ultraviolet light-emitting structure has a first layer having a first portion and a second portion of AlXInYGa(1-X-Y)N with an amount of elemental indium, the first portion surface being treated with silicon and indium containing precursor sources, and a second layer. When an electrical potential is applied to the first layer and the second layer the device emits ultraviolet light.
Public/Granted literature
- US20110012089A1 LOW RESISTANCE ULTRAVIOLET LIGHT EMITTING DEVICE AND METHOD OF FABRICATING THE SAME Public/Granted day:2011-01-20
Information query
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