Invention Grant
- Patent Title: System and method for test structure on a wafer
- Patent Title (中): 晶圆上测试结构的系统和方法
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Application No.: US12616749Application Date: 2009-11-11
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Publication No.: US08415663B2Publication Date: 2013-04-09
- Inventor: Wang Jian Ping , Chin Chang Liao , Waisum Wong
- Applicant: Wang Jian Ping , Chin Chang Liao , Waisum Wong
- Applicant Address: CN Shanghai
- Assignee: Semiconductor Manufacturing International (Shanghai)
- Current Assignee: Semiconductor Manufacturing International (Shanghai)
- Current Assignee Address: CN Shanghai
- Agency: Kilpatrick Townsend & Stockton LLP
- Priority: CN200810205397 20081231
- Main IPC: H01L23/48
- IPC: H01L23/48

Abstract:
System and method for test structure on a wafer. According to an embodiment, the present invention provides a test structure for testing a chip. For example, the test structure and the chip are manufactured on a same substrate material and the testing being conducted is in a temperature-controlled environment. The test structure includes a top structure positioned above the chip. For example, the top structure can be characterized by a first surface area. The top structure includes a first metal material occupying less than 60% of the surface area. The test structure also includes a bottom structure positioned below the chip. For example, the bottom structure can be characterized by a second surface area. The second surface area is substantially equal to the first surface area. The bottom structure includes a first silicon material. The first silicon material occupies substantially all of the second surface area.
Public/Granted literature
- US20100164508A1 SYSTEM AND METHOD FOR TEST STRUCTURE ON A WAFER Public/Granted day:2010-07-01
Information query
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