Invention Grant
US08415702B2 Reflector, manufacture method thereof and light-emitting device including the reflector
有权
反射器及其制造方法以及包括反射器的发光装置
- Patent Title: Reflector, manufacture method thereof and light-emitting device including the reflector
- Patent Title (中): 反射器及其制造方法以及包括反射器的发光装置
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Application No.: US13233367Application Date: 2011-09-15
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Publication No.: US08415702B2Publication Date: 2013-04-09
- Inventor: Qunfeng Pan , Jyh-Chiarng Wu , Kechuang Lin
- Applicant: Qunfeng Pan , Jyh-Chiarng Wu , Kechuang Lin
- Applicant Address: CN Xiamen, Fujian
- Assignee: Xiamen Sanan Optoelectronics Technology Co., Ltd.
- Current Assignee: Xiamen Sanan Optoelectronics Technology Co., Ltd.
- Current Assignee Address: CN Xiamen, Fujian
- Agency: Boyle Fredrickson, S.C.
- Priority: CN201010523518 20101029
- Main IPC: H01L33/00
- IPC: H01L33/00

Abstract:
A reflector for a GaN-based light-emitting device, method for manufacturing the reflector and GaN-based light-emitting device including the reflector are provided. The reflector is formed on a p-type GaN-based epitaxial layer and includes: a whisker crystal of un-doped GaN, formed on a surface of the p-type GaN-based epitaxial layer with a predefined density distribution and at a position that corresponds to a dislocation defect of an epitaxial layer; and a metal reflective layer, formed on both the p-type GaN-based epitaxial layer and the whisker crystal. The whisker of un-doped GaN is positioned on the dislocation defect of the p-type GaN-based epitaxial layer, so that the Ag reflective layer can be separated from the dislocation defect of the p-type GaN-based epitaxial layer, thereby effectively preventing Ag from moving inside the dislocation defect via electromigration, and largely decreasing the possibility of current leakage of the light-emitting device including the Ag reflector.
Public/Granted literature
- US20120104410A1 Reflector, Manufacture Method Thereof And Light-Emitting Device Including The Reflector Public/Granted day:2012-05-03
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