Invention Grant
US08415719B2 Low gate charging rectifier having MOS structure and P-N junction, and manufacturing method of the same
有权
具有MOS结构和P-N结的低栅极充电整流器及其制造方法
- Patent Title: Low gate charging rectifier having MOS structure and P-N junction, and manufacturing method of the same
- Patent Title (中): 具有MOS结构和P-N结的低栅极充电整流器及其制造方法
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Application No.: US13177727Application Date: 2011-07-07
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Publication No.: US08415719B2Publication Date: 2013-04-09
- Inventor: Tzu-Hsiung Chen
- Applicant: Tzu-Hsiung Chen
- Agency: WPAT PC
- Agent Justin King
- Priority: TW99122707A 20100709
- Main IPC: H01L27/06
- IPC: H01L27/06

Abstract:
A low gate charging rectifier having a MOS structure and a P-N junction and a manufacturing method thereof are provided. The low gate charging rectifier is a combination of an N-channel MOS structure and a lateral P-N junction diode. A portion of the gate-covering region is replaced by a thicker dielectric layer or a low conductivity polysilicon layer. In a forward mode, the N-channel MOS structure and the P-N junction diode are connected with each other in parallel. Under this circumstance, like the Schottky diode, the low gate charging rectifier has low forward voltage drop and rapid switching speed. Whereas, in a reverse mode, the leakage current is pinched off and the N-channel is shut off by the depletion region of the P-N junction diode, so that the low gate charging rectifier has low leakage current.
Public/Granted literature
- US20120007152A1 LOW GATE CHARGING RECTIFIER HAVING MOS STRUCTURE AND P-N JUNCTION, AND MANUFACTURING METHOD OF THE SAME Public/Granted day:2012-01-12
Information query
IPC分类: