Invention Grant
US08415731B2 Semiconductor storage device with integrated capacitor and having transistor overlapping sections
有权
具有集成电容器并具有晶体管重叠部分的半导体存储器件
- Patent Title: Semiconductor storage device with integrated capacitor and having transistor overlapping sections
- Patent Title (中): 具有集成电容器并具有晶体管重叠部分的半导体存储器件
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Application No.: US12978759Application Date: 2010-12-27
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Publication No.: US08415731B2Publication Date: 2013-04-09
- Inventor: Shunpei Yamazaki , Jun Koyama , Kiyoshi Kato
- Applicant: Shunpei Yamazaki , Jun Koyama , Kiyoshi Kato
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Fish & Richardson P.C.
- Priority: JP2010-010527 20100120
- Main IPC: H01L29/94
- IPC: H01L29/94 ; H01L27/108

Abstract:
To provide a storage device in which advantages of both a nonvolatile storage device and a volatile storage device can be obtained, a semiconductor device includes a first transistor provided in or over a substrate and a second transistor provided above the first transistor, where at least part of the first transistor and the second transistor are overlapped with each other, and a gate electrode of the first transistor and a source or drain electrode of the second transistor are electrically connected to each other. It is preferable that the first transistor be provided using single crystal silicon and the second transistor be provided using an oxide semiconductor having extremely low off-state current.
Public/Granted literature
- US20110175087A1 SEMICONDUCTOR DEVICE Public/Granted day:2011-07-21
Information query
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