Invention Grant
US08415735B2 Dual conducting floating spacer metal oxide semiconductor field effect transistor (DCFS MOSFET) and method to fabricate the same
有权
双导电浮动间隔金属氧化物半导体场效应晶体管(DCFS MOSFET)及其制造方法相同
- Patent Title: Dual conducting floating spacer metal oxide semiconductor field effect transistor (DCFS MOSFET) and method to fabricate the same
- Patent Title (中): 双导电浮动间隔金属氧化物半导体场效应晶体管(DCFS MOSFET)及其制造方法相同
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Application No.: US12614265Application Date: 2009-11-06
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Publication No.: US08415735B2Publication Date: 2013-04-09
- Inventor: Lee Wang
- Applicant: Lee Wang
- Applicant Address: US CA Diamond Bar
- Assignee: FlashSilicon, Inc.
- Current Assignee: FlashSilicon, Inc.
- Current Assignee Address: US CA Diamond Bar
- Agency: Hogan Lovells US LLP
- Agent Edward C. Kwok
- Main IPC: H01L29/788
- IPC: H01L29/788

Abstract:
Dual Conducting Floating Spacer Metal Oxide Semiconductor Field Effect Transistors (DCFS MOSFETs) and methods for fabricate them using a process that is compatible with forming conventional MOSFETs are disclosed. A DCFS MOSFET can provide multi-bit storage in a single Non-Volatile Memory (NVM) memory cell. Like a typical MOSFET, a DCFS MOSFET includes a control gate electrode on top of a gate dielectric-silicon substrate, thereby forming a main channel of the device. Two electrically isolated conductor spacers are provided on both sides of the control gate and partially overlap two source/drain diffusion areas, which are doped to an opposite type to the conductivity type of the substrate semiconductor. The DCFS MOSFET becomes conducting when a voltage that exceeds a threshold is applied at the control gate and is coupled through the corresponding conducting floating spacer to generate an electrical field strong enough to invert the carriers near the source junction. By storing charge in the two independent conducting floating spacers, DCFS MOSFET can have two independent sets of threshold voltages associated with the source junctions.
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