Invention Grant
- Patent Title: Semiconductor memory device and manufacturing method thereof
- Patent Title (中): 半导体存储器件及其制造方法
-
Application No.: US12726920Application Date: 2010-03-18
-
Publication No.: US08415738B2Publication Date: 2013-04-09
- Inventor: Kazuhiro Nojima
- Applicant: Kazuhiro Nojima
- Applicant Address: JP Tokyo
- Assignee: Elpida Memory, Inc.
- Current Assignee: Elpida Memory, Inc.
- Current Assignee Address: JP Tokyo
- Agency: Morrison & Foerster LLP
- Priority: JP2009-065907 20090318
- Main IPC: H01L29/78
- IPC: H01L29/78

Abstract:
To provide a semiconductor memory device comprising a plurality of silicon pillars arranged in a matrix, whose sidewalls are provided with gate electrodes with gate insulating films interposed between the silicon pillars and the gate electrodes and whose top ends are electrically connected to memory elements, and a bit line and a word line provided between the silicon pillars so as to be orthogonal to each other. The bit line is electrically connected to a bottom end of the silicon pillars on both sides of the bit line in alternate rows, and the word line is electrically connected to a gate electrode formed on a sidewall of the silicon pillars on both sides of the word line in alternate columns.
Public/Granted literature
- US20100237407A1 SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2010-09-23
Information query
IPC分类: