Invention Grant
- Patent Title: Semiconductor device including a guard ring or an inverted region
- Patent Title (中): 包括保护环或倒置区域的半导体器件
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Application No.: US12707209Application Date: 2010-02-17
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Publication No.: US08415765B2Publication Date: 2013-04-09
- Inventor: Atsuya Masada , Mitsuo Horie
- Applicant: Atsuya Masada , Mitsuo Horie
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JPP2009-086976 20090331; JPP2009-086977 20090331
- Main IPC: H01L29/866
- IPC: H01L29/866

Abstract:
A semiconductor device including a semiconductor substrate having a first conductive type layer; a first diffusion region which has the first conductive type and is formed in the first conductive type layer; a second diffusion region which has a second conductive type and an area larger than an area of the first diffusion region and overlaps the first diffusion region; and a PN junction formed at an interface between the first and the second diffusion regions. The second diffusion region includes a ring shaped structure or a guard ring includes an inverted region which has the second conductive type. According to such a configuration, it is possible to provide a semiconductor device having the required Zener characteristics with good controllability.
Public/Granted literature
- US20100244194A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2010-09-30
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