Invention Grant
US08416292B2 Defect inspection apparatus and method 有权
缺陷检查装置及方法

Defect inspection apparatus and method
Abstract:
In a defect inspection apparatus for inspecting a wafer provided with a circuit pattern for defects, the illuminating direction of illuminating light rays is selectively determined such that an area containing a defect that scatters light of high intensity coincides with the aperture of a dark-field detecting system, and such that regularly reflected light regularly reflected by a pattern, which is noise to defect detection, does not coincide with the aperture of the dark field detecting system.
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