Invention Grant
- Patent Title: Wavelength shift measuring apparatus, optical source apparatus, interference measuring apparatus, exposure apparatus, and device manufacturing method
- Patent Title (中): 波长偏移测量装置,光源装置,干涉测量装置,曝光装置和装置制造方法
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Application No.: US12605017Application Date: 2009-10-23
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Publication No.: US08416387B2Publication Date: 2013-04-09
- Inventor: Ko Ishizuka
- Applicant: Ko Ishizuka
- Applicant Address: JP
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2008-274213 20081024; JP2009-223435 20090928
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/32 ; G03B27/68 ; G03B27/58 ; G03B27/62 ; G01B9/02

Abstract:
A wavelength shift measuring apparatus of the present invention is a wavelength shift detection sensor (WLCD1) which measures a shift of a wavelength of a light beam emitted from a light source, and includes a beam splitter (BS2) splitting the light beam emitted from the light source into a plurality of light beams and to synthesize two light beams among the plurality of light beams to generate an interference light, a spacer member (SP) provided so that an optical path length difference of the two light beams split by the beam splitter (PBS2) is constant, and a plurality of photoelectric sensors (PD) detecting the interference light generated by the beam splitter (BS2). The plurality of photoelectric sensors (PD) output a plurality of interference signals having phases shifted from one another based on the interference light to calculate a wavelength shift using the plurality of interference signals.
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