Invention Grant
US08416387B2 Wavelength shift measuring apparatus, optical source apparatus, interference measuring apparatus, exposure apparatus, and device manufacturing method 有权
波长偏移测量装置,光源装置,干涉测量装置,曝光装置和装置制造方法

Wavelength shift measuring apparatus, optical source apparatus, interference measuring apparatus, exposure apparatus, and device manufacturing method
Abstract:
A wavelength shift measuring apparatus of the present invention is a wavelength shift detection sensor (WLCD1) which measures a shift of a wavelength of a light beam emitted from a light source, and includes a beam splitter (BS2) splitting the light beam emitted from the light source into a plurality of light beams and to synthesize two light beams among the plurality of light beams to generate an interference light, a spacer member (SP) provided so that an optical path length difference of the two light beams split by the beam splitter (PBS2) is constant, and a plurality of photoelectric sensors (PD) detecting the interference light generated by the beam splitter (BS2). The plurality of photoelectric sensors (PD) output a plurality of interference signals having phases shifted from one another based on the interference light to calculate a wavelength shift using the plurality of interference signals.
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