Invention Grant
- Patent Title: Fluid handling device, an immersion lithographic apparatus and a device manufacturing method
- Patent Title (中): 流体处理装置，浸没式光刻装置和装置制造方法
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Application No.: US12756754Application Date: 2010-04-08
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Publication No.: US08416388B2Publication Date: 2013-04-09
- Inventor: Erik Henricus Egidius Catharina Eummelen , Koen Steffens , Takeshi Kaneko , Gregory Martin Mason Corcoran
- Applicant: Erik Henricus Egidius Catharina Eummelen , Koen Steffens , Takeshi Kaneko , Gregory Martin Mason Corcoran
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52
Abstract:
A fluid handling system for an immersion lithographic apparatus that has a fluid removal device to remove immersion liquid from an immersion space, and a droplet removal device to remove a droplet of immersion liquid, wherein: the droplet removal device is located further from an optical axis than the fluid removal device, and the droplet removal device comprises a porous member which faces, e.g., the substrate being exposed and/or the substrate table.
Public/Granted literature
- US20100259735A1 FLUID HANDLING DEVICE, AN IMMERSION LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD Public/Granted day:2010-10-14
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