Invention Grant
- Patent Title: Radiation source, lithographic apparatus and device manufacturing method
- Patent Title (中): 辐射源,光刻设备和器件制造方法
-
Application No.: US12809427Application Date: 2008-12-19
-
Publication No.: US08416391B2Publication Date: 2013-04-09
- Inventor: Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer
- Applicant: Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/NL2008/050820 WO 20081219
- International Announcement: WO2009/078722 WO 20090625
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G21G4/00

Abstract:
A radiation source is configured to generate radiation. The radiation source includes a first electrode and a second electrode configured to produce an electrical discharge during use to generate radiation-emitting plasma from a plasma fuel. The radiation source also includes a fuel supply configured to supply a plasma fuel to a fuel release area that is associated with the first electrode and the second electrode, and a fuel release configured to induce release of fuel, supplied by the fuel supply, from the fuel release area. The fuel release area is spaced-apart from the first electrode and from the second electrode.
Public/Granted literature
- US20110134405A1 RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2011-06-09
Information query