Invention Grant
- Patent Title: Method and apparatus for inspecting defects
- Patent Title (中): 检查缺陷的方法和装置
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Application No.: US13483104Application Date: 2012-05-30
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Publication No.: US08416402B2Publication Date: 2013-04-09
- Inventor: Yukihiro Shibata , Yasuhiro Yoshitake
- Applicant: Yukihiro Shibata , Yasuhiro Yoshitake
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2008-106579 20080416
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
To provide a defect inspection apparatus for inspecting defects of a specimen without lowering resolution of a lens, without depending on a polarization characteristic of a defect scattered light, and with high detection sensitivity that is realized by the following. A detection optical path is branched by at least one of spectral splitting and polarization splitting, a spatial filter in the form of a two-dimensional array is disposed after the branch, and only diffracted light is shielded by the spatial filter in the form of a two-dimensional array.
Public/Granted literature
- US20120236296A1 METHOD AND APPARATUS FOR INSPECTING DEFECTS Public/Granted day:2012-09-20
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