Invention Grant
- Patent Title: Interferometric apparatus for detecting 3D position of a diffracting object
- Patent Title (中): 用于检测衍射物体的3D位置的干涉仪
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Application No.: US12715227Application Date: 2010-03-01
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Publication No.: US08416423B2Publication Date: 2013-04-09
- Inventor: Keiji Inada , Mikihiko Ishii , Tetsuya Koike
- Applicant: Mikihiko Ishii , Tetsuya Koike , Akiko Inada
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Klarquist Sparkman, LLP
- Priority: JP2007-220552 20070828
- Main IPC: G01B9/02
- IPC: G01B9/02

Abstract:
A position detecting apparatus includes a light source which supplies a detecting light; a light-collecting optical system which collects the detecting light onto a diffracted light generating portion provided on the object; a light guiding optical system which guides, to a predetermined position, a diffracted measuring light generated from the diffracted light generating portion by receiving the detecting light and a reference light generated from a reference surface by receiving the detecting light; and a photodetector which is arranged at the predetermined position and which detects interference fringes generated by the diffracted measuring light and the reference light. Three-dimensional positional information of, for example, a mask pattern surface or an exposure surface of a photosensitive substrate can be highly accurately detected by a relatively simple construction.
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