Invention Grant
- Patent Title: Phase change memory device and method for manufacturing the same
- Patent Title (中): 相变存储器件及其制造方法
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Application No.: US13036916Application Date: 2011-02-28
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Publication No.: US08416616B2Publication Date: 2013-04-09
- Inventor: Heon Yong Chang , Myoung Sub Kim , Gap Sok Do
- Applicant: Heon Yong Chang , Myoung Sub Kim , Gap Sok Do
- Applicant Address: KR Gyeonggi-do
- Assignee: SK Hynix Inc.
- Current Assignee: SK Hynix Inc.
- Current Assignee Address: KR Gyeonggi-do
- Agency: William Park & Associates Ltd.
- Priority: KR10-2007-0080302 20070809; KR10-2008-0025443 20080319
- Main IPC: G11C11/00
- IPC: G11C11/00

Abstract:
A phase change memory device includes a silicon substrate having a bar-type active region and an N-type impurity region formed in a surface of the active region. A first insulation layer is formed on the silicon substrate, and the first insulation layer includes a plurality of first contact holes and second contact holes. PN diodes are formed in the first contact holes. Heat sinks are formed in the first contact holes on the PN diodes, and contact plugs fill the second contact holes. A second insulation layer having third contact holes is formed on the first insulation layer. Heaters fill the third contact holes. A stack pattern of a phase change layer and a top electrode is formed to contact the heaters. The heat sink quickly cools heat transferred from the heater to the phase change layer.
Public/Granted literature
- US20110312149A1 PHASE CHANGE MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2011-12-22
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