Invention Grant
US08416920B2 Target for X-ray generation, X-ray generator, and method for producing target for X-ray generation
有权
用于X射线产生的目标，X射线发生器和用于产生X射线靶的靶的方法
- Patent Title: Target for X-ray generation, X-ray generator, and method for producing target for X-ray generation
- Patent Title (中): 用于X射线产生的目标，X射线发生器和用于产生X射线靶的靶的方法
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Application No.: US12871192Application Date: 2010-08-30
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Publication No.: US08416920B2Publication Date: 2013-04-09
- Inventor: Katsuya Okumura , Katsuji Kadosawa , Tomofumi Kiyomoto , Motohiro Suyama , Atsushi Ishii
- Applicant: Katsuya Okumura , Katsuji Kadosawa , Tomofumi Kiyomoto , Motohiro Suyama , Atsushi Ishii
- Applicant Address: JP Tokyo JP Hamamatsu-shi, Shizuoka
- Assignee: Tokyo Electron Limited,Hamamatsu Photonics K.K.
- Current Assignee: Tokyo Electron Limited,Hamamatsu Photonics K.K.
- Current Assignee Address: JP Tokyo JP Hamamatsu-shi, Shizuoka
- Agency: Drinker Biddle & Reath LLP
- Priority: JPP2009-204891 20090904
- Main IPC: H01J35/08
- IPC: H01J35/08
Abstract:
A target for X-ray generation has a substrate and a target portion. The substrate is comprised of diamond and has a first principal surface and a second principal surface opposed to each other. A bottomed hole is formed from the first principal surface side in the substrate. The target portion is comprised of a metal deposited from a bottom surface of the hole toward the first principal surface. An entire side surface of the target portion is in close contact with an inside surface of the hole.
Public/Granted literature
- US20110058655A1 TARGET FOR X-RAY GENERATION, X-RAY GENERATOR, AND METHOD FOR PRODUCING TARGET FOR X-RAY GENERATION Public/Granted day:2011-03-10
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