Invention Grant
US08417018B2 Method for inspecting and judging photomask blank or intermediate thereof
有权
检查和判断光掩模坯料或其中间体的方法
- Patent Title: Method for inspecting and judging photomask blank or intermediate thereof
- Patent Title (中): 检查和判断光掩模坯料或其中间体的方法
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Application No.: US12750023Application Date: 2010-03-30
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Publication No.: US08417018B2Publication Date: 2013-04-09
- Inventor: Yukio Inazuki , Hideo Kaneko , Hiroki Yoshikawa
- Applicant: Yukio Inazuki , Hideo Kaneko , Hiroki Yoshikawa
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2009-086173 20090331
- Main IPC: G06K9/00
- IPC: G06K9/00
Abstract:
A photomask blank having a film on a substrate is inspected by (A) measuring a surface topography of a photomask blank having a film to be inspected for stress, (B) removing the film from the photomask blank to provide a treated substrate, (C) measuring a surface topography of the treated substrate, and (D) comparing the surface topography of the photomask blank with the surface topography of the treated substrate, thereby evaluating a stress in the film.
Public/Granted literature
- US20100246932A1 METHOD FOR INSPECTING AND JUDGING PHOTOMASK BLANK OR INTERMEDIATE THEREOF Public/Granted day:2010-09-30
Information query
