Invention Grant
US08419412B2 Nano-imprint mold and substrate with uneven patterns manufactured by using the mold
有权
纳米压印模具和使用模具制造的不均匀图案的基板
- Patent Title: Nano-imprint mold and substrate with uneven patterns manufactured by using the mold
- Patent Title (中): 纳米压印模具和使用模具制造的不均匀图案的基板
-
Application No.: US13422897Application Date: 2012-03-16
-
Publication No.: US08419412B2Publication Date: 2013-04-16
- Inventor: Yuichi Ohsawa , Junichi Ito , Tomotaka Ariga , Yoshinari Kurosaki , Saori Kashiwada
- Applicant: Yuichi Ohsawa , Junichi Ito , Tomotaka Ariga , Yoshinari Kurosaki , Saori Kashiwada
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: B29C59/00
- IPC: B29C59/00

Abstract:
According to one embodiment, a nano-imprint mold includes plural pairs of first and second protrusions formed on a base layer, each of which is formed along the same straight line. Each protrusion has a top surface and four side surfaces. The first and second protrusions are mirror-symmetrical with each other. A first side surface of the first protrusion and a second side surface of the second protrusion face each other. A first angle between the first side surface or the second side surface and a main surface of the base layer is not less than 85° and not more than 90°. A second angle between a third side surface in the first protrusion or a fourth side surface in the second protrusion and the main surface of the base layer is not less than 70° and not more than 88°. The first angle is larger than the second angle.
Public/Granted literature
- US20120196084A1 NANO-IMPRINT MOLD AND SUBSTRATE WITH UNEVEN PATTERNS MANUFACTURED BY USING THE MOLD Public/Granted day:2012-08-02
Information query