Invention Grant
US08420124B2 Methods for fabricating isolated micro- and nano-structures using soft or imprint lithography
有权
使用软或压印光刻制造分离的微结构和纳米结构的方法
- Patent Title: Methods for fabricating isolated micro- and nano-structures using soft or imprint lithography
- Patent Title (中): 使用软或压印光刻制造分离的微结构和纳米结构的方法
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Application No.: US11825469Application Date: 2007-07-06
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Publication No.: US08420124B2Publication Date: 2013-04-16
- Inventor: Joseph M. DeSimone , Jason P. Rolland , Benjamin W. Maynor , Larkin E. Euliss , Ginger Denison Rothrock , Ansley E. Dennis , Edward T. Samulski , R. Jude Samulski
- Applicant: Joseph M. DeSimone , Jason P. Rolland , Benjamin W. Maynor , Larkin E. Euliss , Ginger Denison Rothrock , Ansley E. Dennis , Edward T. Samulski , R. Jude Samulski
- Applicant Address: US NC Chapel Hill
- Assignee: The University of North Carolina at Chapel Hill
- Current Assignee: The University of North Carolina at Chapel Hill
- Current Assignee Address: US NC Chapel Hill
- Agency: Alston & Bird LLP
- Main IPC: A61K9/50
- IPC: A61K9/50 ; A61K9/00
Abstract:
The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography technique.
Public/Granted literature
- US20090061152A1 Methods for fabricating isolated micro- and nano- structures using soft or imprint lithography Public/Granted day:2009-03-05
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