Invention Grant
- Patent Title: Polymer, resist composition, and patterning process
- Patent Title (中): 聚合物，抗蚀剂组合物和图案化工艺
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Application No.: US13006598Application Date: 2011-01-14
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Publication No.: US08420292B2Publication Date: 2013-04-16
- Inventor: Yuji Harada , Takeru Watanabe , Takeshi Sasami , Yuuki Suka , Koji Hasegawa
- Applicant: Yuji Harada , Takeru Watanabe , Takeshi Sasami , Yuuki Suka , Koji Hasegawa
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2010-007945 20100118
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/20 ; G03F7/30 ; G03F7/38
Abstract:
A polymer comprising recurring units of formula (1) and having a solubility in alkaline developer which increases under the action of an alkaline developer is provided. The polymer has transparency to radiation of up to 200 nm and improved water repellency, water slip, acid lability and hydrolysis and is useful as an additive polymer to formulate a resist composition. R1 is H, F, methyl, or trifluoromethyl, R2 is a monovalent fluorinated hydrocarbon group, An is a (n+1)-valent hydrocarbon or fluorinated hydrocarbon group, and n is 1, 2 or 3.
Public/Granted literature
- US20110177455A1 POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS Public/Granted day:2011-07-21
Information query
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