Invention Grant
- Patent Title: Forming method of resist pattern and manufacturing method of thin-film magnetic head
- Patent Title (中): 抗蚀剂图案的形成方法和薄膜磁头的制造方法
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Application No.: US12187128Application Date: 2008-08-06
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Publication No.: US08420299B2Publication Date: 2013-04-16
- Inventor: Hisayoshi Watanabe , Susumu Aoki
- Applicant: Hisayoshi Watanabe , Susumu Aoki
- Applicant Address: JP Tokyo
- Assignee: TDK Corporation
- Current Assignee: TDK Corporation
- Current Assignee Address: JP Tokyo
- Agency: Frommer Lawrence & Haug LLP
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/20 ; G03F7/30 ; G03F7/38
Abstract:
It is therefore an object of the present invention to provide a forming method for a resist pattern to reduce a resist residue in forming the resist pattern on a step whose gradient angle is equal to 90 degrees or more.A forming method for a resist pattern to reduce a resist residue on a step is provided, the method comprising: forming resist film with coating resist containing photo-acid-generator on a step formed on a substrate, where gradient angle of the step is equal to 90 degrees or more, exposing said resist film and generating acid from said photo-acid-generator.
Public/Granted literature
- US20100035189A1 FORMING METHOD OF RESIST PATTERN AND MANUFACTURING METHOD OF THIN-FILM MAGNETIC HEAD Public/Granted day:2010-02-11
Information query
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