Invention Grant
- Patent Title: Method for forming a wiring pattern by laser irradiation
- Patent Title (中): 通过激光照射形成布线图案的方法
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Application No.: US13036634Application Date: 2011-02-28
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Publication No.: US08420301B2Publication Date: 2013-04-16
- Inventor: Chien-Han Ho , Hua-Min Huang
- Applicant: Chien-Han Ho , Hua-Min Huang
- Applicant Address: TW Taoyuan
- Assignee: Cretec Co., Ltd.
- Current Assignee: Cretec Co., Ltd.
- Current Assignee Address: TW Taoyuan
- Agency: Muncy, Geissler, Olds & Lowe, PLLC
- Main IPC: G03F7/26
- IPC: G03F7/26

Abstract:
A method for forming a wiring pattern by laser irradiation includes the steps of coating a light-sensitive material on a substrate to form a light-sensitive layer, irradiating a laser beam on the light-sensitive material of the substrate to form a pattern including an exposed region exposed to laser irradiation and an unexposed region unexposed to laser irradiation, and forming a metallic wiring pattern by immersing the substrate into a solution having a plurality of metallic nano-particles. The metallic nano-particles are easily bonded to the straighter molecular structure of the light-sensitive material in the exposed region for forming a conducting wiring pattern. The laser irradiation method has advantages such as high-power, high-density, high-directionality and monochromaticity, such that product quality can be effectively controlled. Moreover, the laser irradiated light-sensitive material can form a molecular structure that is easily bonded to the metallic particles. As a result, the chemical wastes are substantially reduced.
Public/Granted literature
- US20120219918A1 METHOD FOR FORMING A WIRING PATTERN BY LASER IRRADIATION Public/Granted day:2012-08-30
Information query
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