Invention Grant
US08420302B2 Method of fine patterning a thin film and method of manufacturing a display substrate using the method
有权
精细图案化薄膜的方法和使用该方法制造显示基板的方法
- Patent Title: Method of fine patterning a thin film and method of manufacturing a display substrate using the method
- Patent Title (中): 精细图案化薄膜的方法和使用该方法制造显示基板的方法
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Application No.: US12480132Application Date: 2009-06-08
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Publication No.: US08420302B2Publication Date: 2013-04-16
- Inventor: Yoon-Sung Um , Su-Jeong Kim , Hye-Ran You , Jae-Jin Lyu , Seung-Beom Park
- Applicant: Yoon-Sung Um , Su-Jeong Kim , Hye-Ran You , Jae-Jin Lyu , Seung-Beom Park
- Applicant Address: KR Yongin, Gyeonggi-Do
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: KR2008-66910 20080710
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A method of fine patterning a thin film and a method of manufacturing a display substrate by using the same, in which a fine photo pattern is formed on a base substrate, and a photoresist pattern is formed on the thin film. A fine photo pattern is formed by ashing the photoresist pattern. A fine pattern is formed by removing the thin film exposing through the fine photo pattern. A fine pattern is formed, and the fine pattern has a higher resolution than that of an exposure apparatus. The reliability of a process for manufacturing a display substrate and the display quality of a display device may be improved.
Public/Granted literature
- US20100009295A1 METHOD OF FINE PATTERNING A THIN FILM AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE METHOD Public/Granted day:2010-01-14
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