Invention Grant
US08420541B2 Method for increasing adhesion between polysilazane and silicon nitride
有权
增加聚硅氮烷和氮化硅之间粘附力的方法
- Patent Title: Method for increasing adhesion between polysilazane and silicon nitride
- Patent Title (中): 增加聚硅氮烷和氮化硅之间粘附力的方法
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Application No.: US13102506Application Date: 2011-05-06
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Publication No.: US08420541B2Publication Date: 2013-04-16
- Inventor: Shing-Yih Shih , Yi-Nan Chen , Hsien-Wen Liu
- Applicant: Shing-Yih Shih , Yi-Nan Chen , Hsien-Wen Liu
- Applicant Address: TW Taoyuan
- Assignee: Nanya Technology Corporation
- Current Assignee: Nanya Technology Corporation
- Current Assignee Address: TW Taoyuan
- Main IPC: H01L21/311
- IPC: H01L21/311 ; H01L21/31

Abstract:
A method for increasing adhesion between polysilazane and silicon nitride is disclosed, comprising, providing a substrate comprising a trench, forming a silicon nitride liner layer on a bottom surface and a sidewall of the trench, performing a treating process to the silicon nitride liner layer for producing a hydrophilic surface with OH groups that can increase adhesion between the silicon nitride liner layer and a subsequently formed polysilazane coating layer, and forming a polysilazane coating layer into the trench and on the silicon nitride liner layer.
Public/Granted literature
- US20120282777A1 METHOD FOR INCREASING ADHESION BETWEEN POLYSILAZANE AND SILICON NITRIDE Public/Granted day:2012-11-08
Information query
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