Invention Grant
US08420575B2 Underlying layer of alignment film for oxide superconducting conductor and method of forming same, and device for forming same 有权
用于氧化物超导导体的底层底层及其形成方法及其形成装置

  • Patent Title: Underlying layer of alignment film for oxide superconducting conductor and method of forming same, and device for forming same
  • Patent Title (中): 用于氧化物超导导体的底层底层及其形成方法及其形成装置
  • Application No.: US13440516
    Application Date: 2012-04-05
  • Publication No.: US08420575B2
    Publication Date: 2013-04-16
  • Inventor: Satoru HanyuYasuhiro Iijima
  • Applicant: Satoru HanyuYasuhiro Iijima
  • Applicant Address: JP Tokyo
  • Assignee: Fujikura Ltd.
  • Current Assignee: Fujikura Ltd.
  • Current Assignee Address: JP Tokyo
  • Agency: Sughrue Mion, PLLC
  • Priority: JP2009-233764 20091007
  • Main IPC: H01L39/24
  • IPC: H01L39/24
Underlying layer of alignment film for oxide superconducting conductor and method of forming same, and device for forming same
Abstract:
A method of forming an underlying layer of an alignment film for an oxide superconducting conductor, includes arranging two or more kinds of targets along a lengthwise direction of a base material so as to face a surface of the base material; simultaneously irradiating an ion beam on surfaces of the two or more kinds of targets to deposit constituent particles of the targets on the surface of the base material in the order of the arrangement of the two or more kinds of targets; and forming a laminate in which two or more kinds of thin films are repeatedly laminated on the surface of the base material by passing the base material through a deposition region of the constituent particles a plurality of times so that the constituent particles of the targets are repeatedly deposited on the surface of the base material at each passage.
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