Invention Grant
- Patent Title: Semiconductor device
- Patent Title (中): 半导体器件
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Application No.: US13241107Application Date: 2011-09-22
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Publication No.: US08421153B2Publication Date: 2013-04-16
- Inventor: Kanako Komatsu , Jun Morioka , Koji Shirai , Keita Takahashi , Tsubasa Yamada , Mariko Shimizu
- Applicant: Kanako Komatsu , Jun Morioka , Koji Shirai , Keita Takahashi , Tsubasa Yamada , Mariko Shimizu
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Patterson & Sheridan, LLP
- Priority: JPP2011-63875 20110323
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L27/088

Abstract:
A first semiconductor layer extends from the element region to the element-termination region, and functions as a drain of the MOS transistor. A second semiconductor layer extends, below the first semiconductor layer, from the element region to the element-termination region. A third semiconductor layer extends from the element region to the element-termination region, and is in contact with the second semiconductor layer to function as a drift layer of the MOS transistor. A distance between a boundary between the first semiconductor layer and the field oxide film, and the end portion of the third semiconductor layer on the fifth semiconductor layer side in the element region is smaller than that between a boundary between the first semiconductor layer and the field oxide layer and an end portion of the third semiconductor layer on the fifth semiconductor layer side in the element-termination region.
Public/Granted literature
- US20120241858A1 SEMICONDUCTOR DEVICE Public/Granted day:2012-09-27
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