Invention Grant
- Patent Title: Active spot array lithographic projector system with regulated spots
- Patent Title (中): 主动点阵光刻投影仪系统具有调节点
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Application No.: US12511372Application Date: 2009-07-29
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Publication No.: US08421997B2Publication Date: 2013-04-16
- Inventor: Paul Francis Michaloski
- Applicant: Paul Francis Michaloski
- Applicant Address: US NY Corning
- Assignee: Corning Incorporated
- Current Assignee: Corning Incorporated
- Current Assignee Address: US NY Corning
- Agent Timothy M. Schaeberle
- Main IPC: G03B27/72
- IPC: G03B27/72

Abstract:
An active spot array projection system particularly for microlithographic projection includes a spatial light modulator, such as a digital micromirror device, having individually addressable elements. A focusing array, such as a microlens array, focuses elements transverse segments of the light beam into spots. Within an imaging optic between the spatial light modulator and the focusing array, an spatial frequency filter attenuates certain spatial frequencies of light arising from the irregularities of the individually addressable elements while avoiding attenuating higher spatial frequencies of light arising from the peripheral boundaries of the individually addressable elements for regulating light distributions of the spots while limiting crosstalk between adjacent spots.
Public/Granted literature
- US20100026979A1 ACTIVE SPOT ARRAY LITHOGRAPHIC PROJECTOR SYSTEM WITH REGULATED SPOTS Public/Granted day:2010-02-04
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