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US08422525B1 Optical device structure using miscut GaN substrates for laser applications 有权
使用miscut GaN衬底进行激光应用的光学器件结构

Optical device structure using miscut GaN substrates for laser applications
Abstract:
An optical device capable of emitting light having a wavelength ranging from about 490 to about 580 nanometers has a gallium nitride substrate with a semipolar crystalline surface region characterized by an orientation of greater than 3 degrees from (11-22) towards (0001) but less than about 50 degrees. A laser stripe formed on the substrate has a cavity orientation substantially parallel to the m-direction.
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