Invention Grant
- Patent Title: Semiconductor laser device and method for manufacturing the same
- Patent Title (中): 半导体激光装置及其制造方法
-
Application No.: US12745385Application Date: 2009-10-14
-
Publication No.: US08422526B2Publication Date: 2013-04-16
- Inventor: Katsuya Samonji , Masao Kawaguchi , Hideki Kasugai
- Applicant: Katsuya Samonji , Masao Kawaguchi , Hideki Kasugai
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JP2008-314375 20081210
- International Application: PCT/JP2009/005359 WO 20091014
- International Announcement: WO2010/067500 WO 20100617
- Main IPC: H01S5/00
- IPC: H01S5/00

Abstract:
A semiconductor laser device includes a semiconductor multilayer structure selectively grown on a substrate other than on a predetermined region of the substrate. The semiconductor multilayer structure includes an active layer, and has a stripe-shaped optical waveguide extending in a direction intersecting a front facet through which light is emitted. The active layer has an abnormal growth portion formed at a peripheral edge of the predetermined region, and a larger forbidden band width portion formed around the abnormal growth portion and having a larger width of a forbidden band than that of a portion other than the abnormal growth portion of the active layer. The optical waveguide is spaced apart from the abnormal growth portion and includes the larger forbidden band width portion at the front facet.
Public/Granted literature
- US20110051765A1 SEMICONDUCTOR LASER DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2011-03-03
Information query