Invention Grant
- Patent Title: Surface emitting semiconductor laser
- Patent Title (中): 表面发射半导体激光器
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Application No.: US12832590Application Date: 2010-07-08
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Publication No.: US08422531B2Publication Date: 2013-04-16
- Inventor: Takashi Kondo
- Applicant: Takashi Kondo
- Applicant Address: JP Tokyo
- Assignee: Fuji Xerox Co., Ltd.
- Current Assignee: Fuji Xerox Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2010-002821 20100108
- Main IPC: H01S3/08
- IPC: H01S3/08 ; H01S5/00

Abstract:
A surface emitting semiconductor laser includes a substrate, an n-type lower DBR, an n-type cavity extending region formed on the lower DBR, an active region formed on the cavity extending region, and an upper DBR formed on the active region. A difference in refractive index between a relatively high refractive index layer and a relatively low refractive in the upper DBR is smaller than that in the lower DBR.
Public/Granted literature
- US20110170568A1 SURFACE EMITTING SEMICONDUCTOR LASER Public/Granted day:2011-07-14
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